Difference between revisions of "MPT Corp. RTP-600S Rapid Thermal Annealer"
Jump to navigation
Jump to search
m (Protected "MPT Corp. RTP-600S Rapid Thermal Annealer" ([Edit=Allow only administrators] (indefinite) [Move=Allow only administrators] (indefinite)) [cascading]) |
m (Changed protection level for "MPT Corp. RTP-600S Rapid Thermal Annealer" ([Edit=Allow only autoconfirmed users] (indefinite) [Move=Allow only autoconfirmed users] (indefinite))) |
(No difference)
| |
Latest revision as of 13:35, 2 May 2022
 |
|
| Tool Name | MPT Corp. RTP-600S Rapid Thermal Annealer |
|---|---|
| Instrument Type | Back End |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | MPT Corp. |
| Tool Model | RTP-600S |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | SOP |
Description
The RTP-600S system is an advanced bench-top rapid thermal processing system with multi-gas capabilities. The system processes wafers up to 6″ in diameter. The integrated process control system features real-time graphics, recipe management, data acquisition and display and has a comprehensive diagnostic function.
The system is configured for ≤800°C processing with thermocouple and has the option to flow in nitrogen as a process gas.
Applications
- Rapid thermal annealing of thin-films.