Difference between revisions of "Heidelberg DWL 66+ Laser Writer"
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| imagecaption = | | imagecaption = | ||
| Instrument_Type = Lithography | | Instrument_Type = Lithography | ||
− | | Staff_Manager = | + | | Staff_Manager = [[Ana Cohen | Ana Cohen]] |
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = Heidelberg | | Tool_Manufacturer = Heidelberg | ||
| Tool_Model = DWL 66+ | | Tool_Model = DWL 66+ | ||
− | | | + | | NEMO_Designation = LW-01 |
− | | Lab_Phone = | + | | Lab_Phone = 8-9799 |
− | | SOP Link = [https:// | + | | SOP Link = [https://repository.upenn.edu/scn_protocols/76/ SOP] |
}} | }} | ||
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* Direct laser writing of patterns | * Direct laser writing of patterns | ||
+ | == Processes == | ||
+ | The following exposure parameters may be used to expose photomasks. (Updated Feb 15, 2024) | ||
+ | {| class="wikitable" style="vertical-align:bottom;" | ||
+ | |- | ||
+ | ! Resist | ||
+ | ! Write Head | ||
+ | ! Filter(s) | ||
+ | ! Laser Power (mW) | ||
+ | ! Intensity | ||
+ | ! Focus | ||
+ | ! # of passes | ||
+ | ! Focus mode | ||
+ | |- | ||
+ | | AZ1500 | ||
+ | | 10mm | ||
+ | | 25% | ||
+ | | 60 | ||
+ | | 70% | ||
+ | | +20 | ||
+ | | 1 | ||
+ | | Pneumatic | ||
+ | |- | ||
+ | | IP3500 | ||
+ | | 10mm | ||
+ | | NONE | ||
+ | | 60 | ||
+ | | 70% | ||
+ | | +20 | ||
+ | | 1 | ||
+ | | Pneumatic | ||
+ | |- | ||
+ | | IP3500 | ||
+ | | 2mm | ||
+ | | 25% & 12.5% | ||
+ | | 60 | ||
+ | | 50% | ||
+ | | 0 | ||
+ | | 1 | ||
+ | | Pneumatic | ||
+ | |} | ||
+ | |||
+ | |||
+ | The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) on silicon. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use. [May not be up-to-date. It is always a good idea to check your resist thickness and run a dose test to confirm optimal parameters.] | ||
+ | |||
+ | {| class="wikitable" | ||
+ | |- | ||
+ | ! Resist | ||
+ | ! Spin Speed (RPM) | ||
+ | ! Write Head | ||
+ | ! Filter(s) | ||
+ | ! Laser Power (mW) | ||
+ | ! Intensity | ||
+ | ! # passes | ||
+ | ! Focus mode | ||
+ | |- | ||
+ | | S1805 | ||
+ | | 3000 | ||
+ | | 10mm | ||
+ | | 12.5% | ||
+ | | 105 | ||
+ | | 70% | ||
+ | | 1 | ||
+ | | pneumatic | ||
+ | |- | ||
+ | | S1805 | ||
+ | | 3000 | ||
+ | | 2mm | ||
+ | | 1% & 50% | ||
+ | | 105 | ||
+ | | 100% | ||
+ | | 1 | ||
+ | | pneumatic | ||
+ | |- | ||
+ | | KL5315 | ||
+ | | 5000 | ||
+ | | 10mm | ||
+ | | 50% | ||
+ | | 105 | ||
+ | | 40% | ||
+ | | 1 | ||
+ | | pneumatic | ||
+ | |- | ||
+ | | KL5315 | ||
+ | | 5000 | ||
+ | | 2mm | ||
+ | | 1% | ||
+ | | 75 | ||
+ | | 100% | ||
+ | | 1 | ||
+ | | pneumatic | ||
+ | |- | ||
+ | | S1818 | ||
+ | | 3000 | ||
+ | | 10mm | ||
+ | | NONE | ||
+ | | 65 | ||
+ | | 70% | ||
+ | | 1 | ||
+ | | pneumatic | ||
+ | |- | ||
+ | | S1818 | ||
+ | | 3000 | ||
+ | | 2mm | ||
+ | | 12.5% & 25% | ||
+ | | 60 | ||
+ | | 60% | ||
+ | | 1 | ||
+ | | pneumatic | ||
+ | |} | ||
+ | |||
+ | |||
+ | |||
+ | [[File:LW-01 S1818Lines 25um Feb2024.png|400px|]] [[File:LW-01 S1818Lines 5um Feb2024.png|400px|]] | ||
+ | S1818 at 3000rpm (2.2um thickness) with 10mm writehead [Feb 2024] | ||
+ | 65mW, NO Filter, 70% intensity, + 20 focus | ||
+ | 5um, 10um, 25um, and 50um line widths | ||
== Resources == | == Resources == | ||
+ | |||
+ | * [https://www.youtube.com/watch?v=q_mvEGSCEGI&list=PLiihbHV9HgpWAcmgdpMGBkejcBhEzoKJO Videos - LW-01 Tool Training] | ||
+ | * [https://drive.google.com/file/d/1MUMPdLl4GfXtmg3gJjdiPKbdiyCq-elM/view?usp=drive_link Video - Chuck Installation/Removal] | ||
+ | * [https://www.youtube.com/playlist?list=PLiihbHV9HgpWZikttBFUh2O8EGUsRu348 Videos - BEAMER Training] | ||
===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
− | * [https:// | + | * [https://repository.upenn.edu/scn_protocols/76/ QNF SOP] |
Revision as of 12:41, 1 April 2024
Tool Name | Heidelberg DWL 66+ Laser Writer |
---|---|
Instrument Type | Lithography |
Staff Manager | Ana Cohen |
Lab Location | Bay 2 |
Tool Manufacturer | Heidelberg |
Tool Model | DWL 66+ |
NEMO Designation | LW-01 |
Lab Phone | 8-9799 |
SOP Link | SOP |
Description
The fully automated DWL 66+ laser writing system is located inside an environment chamber for stable environment of the system with controlled laminar airflow and temperature stability. The chamber is situated on a granite base with air cushions for vibration isolation. The optical system includes highly reflective mirrors and acousto-optic modulators for real-time beam correction.
Lens & Resolution
- 2 mm lens (optical autofocus): 600 nm
- 10 mm lens (pneumatic autofocus): 2 µm
- 40 mm lens (pneumatic autofocus): 10 µm
Applications
- Patterning of photomasks
- Direct laser writing of patterns
Processes
The following exposure parameters may be used to expose photomasks. (Updated Feb 15, 2024)
Resist | Write Head | Filter(s) | Laser Power (mW) | Intensity | Focus | # of passes | Focus mode |
---|---|---|---|---|---|---|---|
AZ1500 | 10mm | 25% | 60 | 70% | +20 | 1 | Pneumatic |
IP3500 | 10mm | NONE | 60 | 70% | +20 | 1 | Pneumatic |
IP3500 | 2mm | 25% & 12.5% | 60 | 50% | 0 | 1 | Pneumatic |
The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) on silicon. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use. [May not be up-to-date. It is always a good idea to check your resist thickness and run a dose test to confirm optimal parameters.]
Resist | Spin Speed (RPM) | Write Head | Filter(s) | Laser Power (mW) | Intensity | # passes | Focus mode |
---|---|---|---|---|---|---|---|
S1805 | 3000 | 10mm | 12.5% | 105 | 70% | 1 | pneumatic |
S1805 | 3000 | 2mm | 1% & 50% | 105 | 100% | 1 | pneumatic |
KL5315 | 5000 | 10mm | 50% | 105 | 40% | 1 | pneumatic |
KL5315 | 5000 | 2mm | 1% | 75 | 100% | 1 | pneumatic |
S1818 | 3000 | 10mm | NONE | 65 | 70% | 1 | pneumatic |
S1818 | 3000 | 2mm | 12.5% & 25% | 60 | 60% | 1 | pneumatic |
S1818 at 3000rpm (2.2um thickness) with 10mm writehead [Feb 2024] 65mW, NO Filter, 70% intensity, + 20 focus 5um, 10um, 25um, and 50um line widths