Difference between revisions of "Heidelberg DWL 66+ Laser Writer"
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== Processes == | == Processes == | ||
| − | The following exposure parameters may be used to expose photomasks. | + | The following exposure parameters may be used to expose photomasks. (Updated Feb 15, 2024) |
{| class="wikitable" style="vertical-align:bottom;" | {| class="wikitable" style="vertical-align:bottom;" | ||
|- | |- | ||
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| 25% | | 25% | ||
| 60 | | 60 | ||
| − | | | + | | 70% |
| − | | | + | | +20 |
| 1 | | 1 | ||
| Pneumatic | | Pneumatic | ||
| Line 53: | Line 53: | ||
| IP3500 | | IP3500 | ||
| 10mm | | 10mm | ||
| − | | | + | | NONE |
| 60 | | 60 | ||
| 70% | | 70% | ||
| − | | | + | | +20 |
| 1 | | 1 | ||
| Pneumatic | | Pneumatic | ||
| Line 71: | Line 71: | ||
| − | The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) on silicon. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use. | + | The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) on silicon. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use. [May not be up-to-date. It is always a good idea to check your resist thickness and run a dose test to confirm optimal parameters.] |
{| class="wikitable" | {| class="wikitable" | ||
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| 3000 | | 3000 | ||
| 10mm | | 10mm | ||
| − | | | + | | 12.5% |
| − | | | + | | 105 |
| − | | | + | | 70% |
| 1 | | 1 | ||
| pneumatic | | pneumatic | ||
| Line 106: | Line 106: | ||
| 10mm | | 10mm | ||
| 50% | | 50% | ||
| − | | | + | | 105 |
| − | | | + | | 40% |
| 1 | | 1 | ||
| pneumatic | | pneumatic | ||
| Line 123: | Line 123: | ||
| 3000 | | 3000 | ||
| 10mm | | 10mm | ||
| − | | | + | | NONE |
| 65 | | 65 | ||
| − | | | + | | 70% |
| 1 | | 1 | ||
| pneumatic | | pneumatic | ||
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| pneumatic | | pneumatic | ||
|} | |} | ||
| + | |||
| + | |||
| + | |||
| + | [[File:LW-01 S1818Lines 25um Feb2024.png|400px|]] [[File:LW-01 S1818Lines 5um Feb2024.png|400px|]] | ||
| + | S1818 at 3000rpm (2.2um thickness) with 10mm writehead [Feb 2024] | ||
| + | 65mW, NO Filter, 70% intensity, + 20 focus | ||
| + | 5um, 10um, 25um, and 50um line widths | ||
== Resources == | == Resources == | ||
| + | |||
| + | * [https://www.youtube.com/watch?v=q_mvEGSCEGI&list=PLiihbHV9HgpWAcmgdpMGBkejcBhEzoKJO Videos - LW-01 Tool Training] | ||
| + | * [https://drive.google.com/file/d/1MUMPdLl4GfXtmg3gJjdiPKbdiyCq-elM/view?usp=drive_link Video - Chuck Installation/Removal] | ||
| + | * [https://www.youtube.com/playlist?list=PLiihbHV9HgpWZikttBFUh2O8EGUsRu348 Videos - BEAMER Training] | ||
===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
* [https://repository.upenn.edu/scn_protocols/76/ QNF SOP] | * [https://repository.upenn.edu/scn_protocols/76/ QNF SOP] | ||
Revision as of 12:41, 1 April 2024
 |
|
| Tool Name | Heidelberg DWL 66+ Laser Writer |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Ana Cohen |
| Lab Location | Bay 2 |
| Tool Manufacturer | Heidelberg |
| Tool Model | DWL 66+ |
| NEMO Designation | LW-01 |
| Lab Phone | 8-9799 |
| SOP Link | SOP |
Description
The fully automated DWL 66+ laser writing system is located inside an environment chamber for stable environment of the system with controlled laminar airflow and temperature stability. The chamber is situated on a granite base with air cushions for vibration isolation. The optical system includes highly reflective mirrors and acousto-optic modulators for real-time beam correction.
Lens & Resolution
- 2 mm lens (optical autofocus): 600 nm
- 10 mm lens (pneumatic autofocus): 2 µm
- 40 mm lens (pneumatic autofocus): 10 µm
Applications
- Patterning of photomasks
- Direct laser writing of patterns
Processes
The following exposure parameters may be used to expose photomasks. (Updated Feb 15, 2024)
| Resist | Write Head | Filter(s) | Laser Power (mW) | Intensity | Focus | # of passes | Focus mode |
|---|---|---|---|---|---|---|---|
| AZ1500 | 10mm | 25% | 60 | 70% | +20 | 1 | Pneumatic |
| IP3500 | 10mm | NONE | 60 | 70% | +20 | 1 | Pneumatic |
| IP3500 | 2mm | 25% & 12.5% | 60 | 50% | 0 | 1 | Pneumatic |
The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) on silicon. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use. [May not be up-to-date. It is always a good idea to check your resist thickness and run a dose test to confirm optimal parameters.]
| Resist | Spin Speed (RPM) | Write Head | Filter(s) | Laser Power (mW) | Intensity | # passes | Focus mode |
|---|---|---|---|---|---|---|---|
| S1805 | 3000 | 10mm | 12.5% | 105 | 70% | 1 | pneumatic |
| S1805 | 3000 | 2mm | 1% & 50% | 105 | 100% | 1 | pneumatic |
| KL5315 | 5000 | 10mm | 50% | 105 | 40% | 1 | pneumatic |
| KL5315 | 5000 | 2mm | 1% | 75 | 100% | 1 | pneumatic |
| S1818 | 3000 | 10mm | NONE | 65 | 70% | 1 | pneumatic |
| S1818 | 3000 | 2mm | 12.5% & 25% | 60 | 60% | 1 | pneumatic |
S1818 at 3000rpm (2.2um thickness) with 10mm writehead [Feb 2024] 65mW, NO Filter, 70% intensity, + 20 focus 5um, 10um, 25um, and 50um line widths
