Difference between revisions of "Heidelberg DWL 66+ Laser Writer"

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| imagecaption =  
 
| imagecaption =  
 
| Instrument_Type = Lithography
 
| Instrument_Type = Lithography
| Staff_Manager = David Jones
+
| Staff_Manager = [[Ana Cohen | Ana Cohen]]
 
| Lab_Location = Bay 2
 
| Lab_Location = Bay 2
 
| Tool_Manufacturer = Heidelberg  
 
| Tool_Manufacturer = Heidelberg  
 
| Tool_Model = DWL 66+
 
| Tool_Model = DWL 66+
| Iris_Designation = LW-01
+
| NEMO_Designation = LW-01
 
| Lab_Phone = 8-9799
 
| Lab_Phone = 8-9799
 
| SOP Link = [https://repository.upenn.edu/scn_protocols/76/ SOP]
 
| SOP Link = [https://repository.upenn.edu/scn_protocols/76/ SOP]
Line 30: Line 30:
  
 
== Processes ==
 
== Processes ==
The following exposure parameters may be used to expose photomasks.
+
The following exposure parameters may be used to expose photomasks. (Updated Feb 15, 2024)
 
{| class="wikitable" style="vertical-align:bottom;"
 
{| class="wikitable" style="vertical-align:bottom;"
 
|-
 
|-
Line 44: Line 44:
 
| AZ1500
 
| AZ1500
 
| 10mm
 
| 10mm
| 50%
+
| 25%
| 50
+
| 60
 
| 70%
 
| 70%
| 30
+
| +20
 
| 1
 
| 1
 
| Pneumatic
 
| Pneumatic
Line 53: Line 53:
 
| IP3500
 
| IP3500
 
| 10mm
 
| 10mm
| None
+
| NONE
| 50
+
| 60
| 90%
+
| 70%
| 30
+
| +20
| 2
+
| 1
 
| Pneumatic
 
| Pneumatic
 
|-
 
|-
 
| IP3500
 
| IP3500
 
| 2mm
 
| 2mm
| 25%
+
| 25% & 12.5%
| 50
+
| 60
| 30%
+
| 50%
| 30
+
| 0
 
| 1
 
| 1
 
| Pneumatic
 
| Pneumatic
Line 71: Line 71:
  
  
The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) with the 10mm write head.  For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use.
+
The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) on silicon.  For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use. [May not be up-to-date. It is always a good idea to check your resist thickness and run a dose test to confirm optimal parameters.]
  
{| class="wikitable" style="vertical-align:bottom;"
+
{| class="wikitable"  
 
|-
 
|-
! Resist thk  (µm)
+
! Resist
! Laser power (mW)
+
! Spin Speed (RPM)
 +
! Write Head
 +
! Filter(s)
 +
! Laser Power (mW)
 
! Intensity
 
! Intensity
! Filter
+
! # passes
 +
! Focus mode
 
|-
 
|-
| 0.50
+
| S1805
| 28.8
+
| 3000
| 100%
+
| 10mm
| None
+
| 12.5%
 +
| 105
 +
| 70%
 +
| 1
 +
| pneumatic
 
|-
 
|-
| 0.55
+
| S1805
| 29.5
+
| 3000
 +
| 2mm
 +
| 1% & 50%
 +
| 105
 
| 100%
 
| 100%
| None
+
| 1
 +
| pneumatic
 
|-
 
|-
| 0.60
+
| KL5315
| 30.3
+
| 5000
| 100%
+
| 10mm
| None
+
| 50%
 +
| 105
 +
| 40%
 +
| 1
 +
| pneumatic
 
|-
 
|-
| 0.65
+
| KL5315
| 31.3
+
| 5000
 +
| 2mm
 +
| 1%
 +
| 75
 
| 100%
 
| 100%
| None
+
| 1
 +
| pneumatic
 
|-
 
|-
| 0.70
+
| S1818
| 32.3
+
| 3000
| 100%
+
| 10mm
| None
+
| NONE
 +
| 65
 +
| 70%
 +
| 1
 +
| pneumatic
 
|-
 
|-
| 0.75
+
| S1818
| 33.4
+
| 3000
| 100%
+
| 2mm
| None
+
| 12.5% & 25%
|-
+
| 60
| 0.80
+
| 60%
| 34.7
+
| 1
| 100%
+
| pneumatic
| None
 
|-
 
| 0.85
 
| 36.0
 
| 100%
 
| None
 
|-
 
| 0.90
 
| 37.5
 
| 100%
 
| None
 
|-
 
| 0.95
 
| 39.1
 
| 100%
 
| None
 
|-
 
| 1.00
 
| 40.8
 
| 100%
 
| None
 
|-
 
| 1.05
 
| 42.6
 
| 100%
 
| None
 
|-
 
| 1.10
 
| 44.5
 
| 100%
 
| None
 
|-
 
| 1.15
 
| 46.5
 
| 100%
 
| None
 
|-
 
| 1.20
 
| 48.7
 
| 100%
 
| None
 
|-
 
| 1.25
 
| 50.9
 
| 100%
 
| None
 
|-
 
| 1.30
 
| 53.3
 
| 100%
 
| None
 
|-
 
| 1.35
 
| 55.8
 
| 100%
 
| None
 
|-
 
| 1.40
 
| 58.3
 
| 100%
 
| None
 
|-
 
| 1.45
 
| 61.0
 
| 100%
 
| None
 
|-
 
| 1.50
 
| 63.8
 
| 100%
 
| None
 
 
|}
 
|}
  
  
The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) with the 2mm write head.  For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use.
+
 
{| class="wikitable"
+
  [[File:LW-01 S1818Lines 25um Feb2024.png|400px|]] [[File:LW-01 S1818Lines 5um Feb2024.png|400px|]]
|- style="vertical-align:bottom;"
+
  S1818 at 3000rpm (2.2um thickness) with 10mm writehead [Feb 2024]
! Resist Thk (µm)
+
  65mW, NO Filter, 70% intensity, + 20 focus
! Laser Power (mW)
+
  5um, 10um, 25um, and 50um line widths
! Intensity
 
! Filter
 
|-
 
| style="vertical-align:bottom;" | 0.5
 
| 24.1
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.55
 
| 26.4
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.6
 
| 28.7
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.65
 
| 31.0
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.7
 
| 33.2
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.75
 
| 35.5
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.8
 
| 37.7
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.85
 
| 40.0
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.9
 
| 42.2
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 0.95
 
| 44.4
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1
 
| 46.6
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.05
 
| 48.8
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.1
 
| 51.0
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.15
 
| 53.1
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.2
 
| 55.3
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.25
 
| 57.4
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.3
 
| 59.6
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.35
 
| 61.7
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.4
 
| 63.8
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.45
 
| 65.9
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|-
 
| style="vertical-align:bottom;" | 1.5
 
| 68.0
 
| style="vertical-align:bottom;" | 70%
 
| style="vertical-align:bottom;" | 12.5% & 25%
 
|}
 
  
 
== Resources ==
 
== Resources ==
 +
 +
* [https://www.youtube.com/watch?v=q_mvEGSCEGI&list=PLiihbHV9HgpWAcmgdpMGBkejcBhEzoKJO Videos - LW-01 Tool Training]
 +
* [https://drive.google.com/file/d/1MUMPdLl4GfXtmg3gJjdiPKbdiyCq-elM/view?usp=drive_link Video - Chuck Installation/Removal]
 +
* [https://www.youtube.com/playlist?list=PLiihbHV9HgpWZikttBFUh2O8EGUsRu348 Videos - BEAMER Training]
  
 
===== SOPs & Troubleshooting =====
 
===== SOPs & Troubleshooting =====
 
* [https://repository.upenn.edu/scn_protocols/76/ QNF SOP]
 
* [https://repository.upenn.edu/scn_protocols/76/ QNF SOP]

Revision as of 12:41, 1 April 2024


Heidelberg DWL 66+ Laser Writer
LW-01.jpeg
Tool Name Heidelberg DWL 66+ Laser Writer
Instrument Type Lithography
Staff Manager Ana Cohen
Lab Location Bay 2
Tool Manufacturer Heidelberg
Tool Model DWL 66+
NEMO Designation LW-01
Lab Phone 8-9799
SOP Link SOP

Description

The fully automated DWL 66+ laser writing system is located inside an environment chamber for stable environment of the system with controlled laminar airflow and temperature stability. The chamber is situated on a granite base with air cushions for vibration isolation. The optical system includes highly reflective mirrors and acousto-optic modulators for real-time beam correction.

Lens & Resolution

  • 2 mm lens (optical autofocus): 600 nm
  • 10 mm lens (pneumatic autofocus): 2 µm
  • 40 mm lens (pneumatic autofocus): 10 µm


Applications
  • Patterning of photomasks
  • Direct laser writing of patterns

Processes

The following exposure parameters may be used to expose photomasks. (Updated Feb 15, 2024)

Resist Write Head Filter(s) Laser Power (mW) Intensity Focus # of passes Focus mode
AZ1500 10mm 25% 60 70% +20 1 Pneumatic
IP3500 10mm NONE 60 70% +20 1 Pneumatic
IP3500 2mm 25% & 12.5% 60 50% 0 1 Pneumatic


The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) on silicon. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use. [May not be up-to-date. It is always a good idea to check your resist thickness and run a dose test to confirm optimal parameters.]

Resist Spin Speed (RPM) Write Head Filter(s) Laser Power (mW) Intensity # passes Focus mode
S1805 3000 10mm 12.5% 105 70% 1 pneumatic
S1805 3000 2mm 1% & 50% 105 100% 1 pneumatic
KL5315 5000 10mm 50% 105 40% 1 pneumatic
KL5315 5000 2mm 1% 75 100% 1 pneumatic
S1818 3000 10mm NONE 65 70% 1 pneumatic
S1818 3000 2mm 12.5% & 25% 60 60% 1 pneumatic


 LW-01 S1818Lines 25um Feb2024.png LW-01 S1818Lines 5um Feb2024.png
 S1818 at 3000rpm (2.2um thickness) with 10mm writehead [Feb 2024]
 65mW, NO Filter, 70% intensity, + 20 focus
 5um, 10um, 25um, and 50um line widths

Resources

SOPs & Troubleshooting