Difference between revisions of "CEE 200X Spinner"

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[[Category:Back End]]
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{{EquipmentInfo
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| name = CEE 200X Spinner
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| Tool_Name = CEE 200X Spinner
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| image = [[Image:SPN-07.png |300px]]
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| imagecaption =
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| Instrument_Type = Back End
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| Staff_Manager = [[Ana Cohen | Ana Cohen]]
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| Lab_Location = Singh 124
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| Tool_Manufacturer = CEE
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| Tool_Model = 200X
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| NEMO_Designation = SPN-07
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| Lab_Phone = 3-9639
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| SOP Link = [https://repository.upenn.edu/scn_sop/10/ SOP]
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}}
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== Description ==
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Spinner for coating substrates with resists and protective coverings for laser-cutting and dicing. Can also be used to apply PDMS. Control of ramp rate and speed. Includes wafer centering step.
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== Resources ==
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===== SOPs & Troubleshooting =====
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* SOP: [https://www.seas.upenn.edu/~nanosop/CEE_200X_Spinner_SOP.htm SOP]
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* Video for basic tool use (6.47min):[https://www.youtube.com/watch?v=ybFHtd2pPYs Video]

Latest revision as of 16:13, 12 March 2024


CEE 200X Spinner
SPN-07.png
Tool Name CEE 200X Spinner
Instrument Type Back End
Staff Manager Ana Cohen
Lab Location Singh 124
Tool Manufacturer CEE
Tool Model 200X
NEMO Designation SPN-07
Lab Phone 3-9639
SOP Link SOP

Description

Spinner for coating substrates with resists and protective coverings for laser-cutting and dicing. Can also be used to apply PDMS. Control of ramp rate and speed. Includes wafer centering step.

Resources

SOPs & Troubleshooting
  • SOP: SOP
  • Video for basic tool use (6.47min):Video