Difference between revisions of "Au master recipe"
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> [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]] < | > [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]] < | ||
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| + | Step T006 is the deposition step. | ||
{| class="wikitable" | {| class="wikitable" | ||
Latest revision as of 12:31, 31 January 2023
> Click here to return to PVD-05 <
Step T006 is the deposition step.
| Step Number | T000 | T001 | T002 | T003 | T004 | T005 | T006 | T007 | T008 | T009 | T010 | T011 | T012 | T013 |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Step Time (sec) | 5 | 30 | 30 | 30 | 30 | 30 | [dep] | 30 | 30 | 30 | 30 | 30 | 300 | 5 |
| Min Vacuum Setpoint (Torr) | ||||||||||||||
| Gas - (PID or Fixed) | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | |||
| Gas - PID Master Gas Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |||
| Gas1 - Setpoint (sccm) | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | |||
| Gas2 - Setpoint (sccm) | ||||||||||||||
| Gas PID Pressure (mTorr) | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | |||
| RF Source - Sputter (Watts) | ||||||||||||||
| RF Source - Cathode Select | ||||||||||||||
| RF Source - Shutter | ||||||||||||||
| DC 1 Source - Sputter (Watts) | 25 | 50 | 75 | 100 | 125 | 140 | 120 | 100 | 80 | 60 | 25 | |||
| DC 1 Source - Cathode Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |||
| DC 1 Source - Shutter | Open | |||||||||||||
| DC 2 Source - Sputter (Watts) | ||||||||||||||
| DC 2 Source - Shutter | ||||||||||||||
| Pressure Control (Throttle) | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | ||
| Ignition Pressure (mTorr) | ||||||||||||||
| Rotation Speed (0-100%) | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | |
| End Process (Yes) | Yes |