Equipment

From Quattrone Nanofabrication Facility
Revision as of 12:18, 14 March 2022 by Trevinoj (talk | contribs) (Created page with "== Deposition == ===== Evaporation ===== * Lesker Nano-36 Thermal Evaporator * Lesker PVD75 E-Beam/Thermal Evaporator * Lesker PVD75 E-beam Evaporator ===== Sputtering =====...")
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Deposition

Evaporation
  • Lesker Nano-36 Thermal Evaporator
  • Lesker PVD75 E-Beam/Thermal Evaporator
  • Lesker PVD75 E-beam Evaporator
Sputtering
  • Lesker PVD75 DC/RF Sputterer
  • Denton Explorer14 Magnetron Sputterer
Chemical Vapor Deposition (CVD)
  • Cambridge Nanotech S200 ALD
  • Veeco Savannah 200
  • Oxford PlasmaLab 100 PECVD
  • MRL Wet/Dry Thermal Oxide Furnace
  • MRL LPCVD Silicon Nitride Furnace
Dielectric Packaging / Moisture Barrier
  • SCS PDS2010 Parylene Coater
Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=Equipment&oldid=62"