Nanoscribe Photonic Professional GT
Revision as of 14:39, 29 March 2022 by Trevinoj (talk | contribs) (Created page with "Category:Lithography {{EquipmentInfo | name = Nanoscribe Photonic Professional GT | Tool_Name = Nanoscribe Photonic Professional GT | image = 300px |...")
Tool Name | Nanoscribe Photonic Professional GT |
---|---|
Instrument Type | Lithography |
Staff Manager | David Jones |
Lab Location | Bay 2 |
Tool Manufacturer | Nanoscribe |
Tool Model | Photonic Professional GT |
NEMO Designation | {{{NEMO_Designation}}} |
Lab Phone | XXXXX |
SOP Link | SOP |
Description
The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.
Key Features
- Laser power: 50-150 mW, Wavelength: 780 nm, Pulse ~100 fs, Repetition rate: 80 MHz
- Available for Conventional 3D printing mode, Dip-in Liquid mode and air mode
- 3D printing with lateral resolution ~ 200 nm, vertical resolution ~ 300 nm
- High-precision Piezo scanning range: 300 x 300 x 300 μm3
- Motorized XY-scanning range: 100 x 100 mm2