ABM Mask Aligner
| Tool Name | ABM Mask Aligner |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Ana Cohen |
| Lab Location | Bay 6 |
| Tool Manufacturer | ABM |
| Tool Model | |
| NEMO Designation | MA-03 |
| Lab Phone | xxxxx |
| SOP Link | |
Description
The ABM Mask Aligner is a manual and versatile mask aligner with top-side alignment and substrate capabilities from 100mm down to small pieces. Requires a 5" mask or 5" glass plate with film mask.
Applications
Tool is used primarily for SU8 exposure. It can also be used for aligning PDMS components for PDMS-to-PDMS bonding.
Exposure time = dose (mJ/cm^2) / intensity (mW/cm^2) Dose can be determined from the resist data sheet. See table below for intensities.
To obtain vertical sidewalls with a Cr glass mask, use the long pass filter (PL-360-LP) which eliminates UV emission below 350nm. Do not use with film masks. Inherent defects in film masks will be accentuated, resulting in worse results.
| NO MASK | 20 mW/cm^2 | 100% of output |
| GLASS MASK | 17.5 mW/cm^2 | 87.5% |
| GLASS + FILM MASK | 13.7 mW/cm^2 | 68.5% |
| GLASS + LP FILTER | 9.4 mW/cm^2 | 47.0% |
| GLASS + FILM + LP FILTER | 7.4 mW/cm^2 | 37.0% |
More information about Soft Lithography processing can be found under Process Resources
Resources
MA-01 to MA-03 Calculator
SOPs & Troubleshooting
- SOP: [ SOP]
- Video for basic tool use (no audio, 5.52min):Basic Video
- Video (LayoutEditor - negative resist alignment marks): Video