Tergeo-Plus Plasma Cleaner

From Quattrone Nanofabrication Facility
Revision as of 14:32, 2 December 2024 by Lucasamb (talk | contribs) (Created page with "Category:Thermal Processing {{EquipmentInfo | Tool_Name = Tergeo Plus Plasma Cleaner | image = 300px | imagecaption = | Instrument_Type = Etch | Staff...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search


{{{name}}}
DE09.jpg
Tool Name Tergeo Plus Plasma Cleaner
Instrument Type Etch
Staff Manager Lucas Barreto
Lab Location Bay 1
Tool Manufacturer Pie Scietific
Tool Model Tergeo Plus
NEMO Designation DE-09
Lab Phone 215-898-9736
SOP Link {{{SOP Link}}}

Description

The PIE Scientific Tergeo-Plus Plasma Cleaner is an RF etcher designed for sample cleaning and ashing of resist with a maximum power of 500 W. It is equipped with three process gasses, O2, Ar, and H2O. It is capable of direct or downstream plasma, pulsed plasma mode, and has in-situ plasma monitoring for precise process control. The tool can hold samples from piece parts to a single 6” wafer. It can also hold a cassette of 25 4” wafers.

Resources

SOP