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- ...d optical lithography, physical and chemical vapor deposition, dry and wet processing, metrology, and device characterization. The facility is managed by full-ti3 KB (391 words) - 09:08, 2 August 2024
- === Vapor/Wet Etch === * '' '''SPN-07''' is listed under Back End Processing'' <br>6 KB (803 words) - 11:20, 3 October 2024
- | MRL Wet/Dry Thermal Oxide || CVD-02 A || Thermal Processing || [[Sam Azadi | Sam Azadi]] | MRL LPCVD Silicon Nitride || CVD-02 B || Thermal Processing || [[Sam Azadi | Sam Azadi]]7 KB (875 words) - 11:14, 13 August 2024
- [[Category:Wet Processing]] | Instrument_Type = Wet Processing838 bytes (104 words) - 14:25, 3 January 2024
- ...shooting. Her primary focuses are lithography, metrology, and wet chemical processing, with a specialization in photolithography/laser writing. She also is passi986 bytes (125 words) - 14:30, 3 January 2024