Heidelberg DWL 66+ Laser Writer
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| Tool Name | Heidelberg DWL 66+ Laser Writer |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | David Jones |
| Lab Location | Bay 2 |
| Tool Manufacturer | Heidelberg |
| Tool Model | DWL 66+ |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | 8-9799 |
| SOP Link | SOP |
Description
The fully automated DWL 66+ laser writing system is located inside an environment chamber for stable environment of the system with controlled laminar airflow and temperature stability. The chamber is situated on a granite base with air cushions for vibration isolation. The optical system includes highly reflective mirrors and acousto-optic modulators for real-time beam correction.
Lens & Resolution
- 2 mm lens (optical autofocus): 600 nm
- 10 mm lens (pneumatic autofocus): 2 µm
- 40 mm lens (pneumatic autofocus): 10 µm
Applications
- Patterning of photomasks
- Direct laser writing of patterns
Processes
The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) with the 10mm write head (2mm write head conditions are not available at this time). For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use.
| Resist thk (µm) | Laser power (mW) | Intensity | Filter |
|---|---|---|---|
| 0.50 | 28.83 | 100% | 50% |
| 0.55 | 29.53 | 100% | 50% |
| 0.60 | 30.33 | 100% | 50% |
| 0.65 | 31.25 | 100% | 50% |
| 0.70 | 32.28 | 100% | 50% |
| 0.75 | 33.41 | 100% | 50% |
| 0.80 | 34.66 | 100% | 50% |
| 0.85 | 36.03 | 100% | 50% |
| 0.90 | 37.50 | 100% | 50% |
| 0.95 | 39.08 | 100% | 50% |
| 1.00 | 40.78 | 100% | 50% |
| 1.05 | 42.58 | 100% | 50% |
| 1.10 | 44.50 | 100% | 50% |
| 1.15 | 46.53 | 100% | 50% |
| 1.20 | 48.67 | 100% | 50% |
| 1.25 | 50.92 | 100% | 50% |
| 1.30 | 53.28 | 100% | 50% |
| 1.35 | 55.75 | 100% | 50% |
| 1.40 | 58.34 | 100% | 50% |
| 1.45 | 61.03 | 100% | 50% |
| 1.50 | 63.84 | 100% | 50% |