Equipment

Deposition

Evaporation

• Lesker Nano-36 Thermal Evaporator
• Lesker PVD75 E-Beam/Thermal Evaporator
• Lesker PVD75 E-beam Evaporator

Sputtering

• Lesker PVD75 DC/RF Sputterer
• Denton Explorer14 Magnetron Sputterer

Chemical Vapor Deposition (CVD)

• Cambridge Nanotech S200 ALD
• Veeco Savannah 200
• Oxford PlasmaLab 100 PECVD
• MRL Wet/Dry Thermal Oxide Furnace
• MRL LPCVD Silicon Nitride Furnace

Etch

Plasma Etch

• Anatech SCE-108 Barrel Asher
• SPTS Si DRIE
• Oxford 80 Plus RIE
• Oxford Cobra ICP Etcher
• Jupiter II RIE Plasma Etcher

Vapor / Wet Etch

• SPTS/Xactix XeF2 Isotropic Etcher

Lithography

E-beam Lithography

• Elionix ELS-7500EX E-Beam Lithography System
• Litho Workstation for BEAMER and TRACER

Laser Lithography

• Heidelberg DWL 66+ Laser Writer
• Nanoscribe Photonic Professional GT

Photolithography

• SUSS MicroTec MA6 Gen3 Mask Aligner

Imprint Lithography

• Nanonex NX2600 Nanoimprint

Soft Lithography

• Anatech SCE-106 Barrel Asher
• ABM3000HR Mask Aligner
• SCS PDS2010 Parylene Coater
• Silanization Dessicator
• Spinner - SU-8/PDMS