IPG IX-255 Excimer Micromachining Laser

From Quattrone Nanofabrication Facility
Revision as of 10:55, 14 November 2024 by Ericdj (talk | contribs)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search


IPG IX-255 Excimer Micromachining Laser - 193nm
LMM-01.jpeg
Tool Name IPG IX-255 Excimer Micromachining Laser
Instrument Type Back End
Staff Manager Eric Johnston
Lab Location Singh 124
Tool Manufacturer IPG
Tool Model IX-255
NEMO Designation LMM-01
Lab Phone 3-9639
SOP Link SOP

Description

The IPG IX-255 Excimer Laser is a highly flexible UV laser micromachining system for multi-purpose, R&D and production applications. The system combines a Class 1 workstation integrated with a proprietary UV (193nm) laser and beam shape selector (infinitely variable rectangular and discrete circular) to machine transparent samples such as plastic, glass, and PDMS.

Specifications
  • SN 32826
  • Laser 193nm
  • Pulse Energy up to 10 mJ
  • X-Y Positional Accuracy: <3 μm
  • Z-theta Accuracy: <10 μm, ±0.02°
  • Fixed Optics
  • Vision System Resolution 0.12 μm/ pixel
  • DXF and DWG drawing files accepted
Applications
  • Laser machining of plastics, glass and PDMS.


Resources

SOPs & Troubleshooting
Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=IPG_IX-255_Excimer_Micromachining_Laser&oldid=2132"