Difference between revisions of "CEE 200X Spinner"
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| Lab_Location = Soft Lithography | | Lab_Location = Soft Lithography | ||
| Tool_Manufacturer = CEE | | Tool_Manufacturer = CEE | ||
| − | | Tool_Model = | + | | Tool_Model = 200X |
| Iris_Designation = SPN-07 | | Iris_Designation = SPN-07 | ||
| Lab_Phone = 3-9639 | | Lab_Phone = 3-9639 | ||
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== Description == | == Description == | ||
| − | Spinner for coating substrates with thicker resists as well as PDMS. Control of ramp rate and speed. | + | Spinner for coating substrates with thicker resists as well as PDMS. Control of ramp rate and speed. Includes wafer centering step. |
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== Resources == | == Resources == | ||
Revision as of 13:29, 15 August 2022
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| Tool Name | Spinner - SU8/PDMS |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Eric Johnston |
| Lab Location | Soft Lithography |
| Tool Manufacturer | CEE |
| Tool Model | 200X |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | 3-9639 |
| SOP Link | SOP |
Description
Spinner for coating substrates with thicker resists as well as PDMS. Control of ramp rate and speed. Includes wafer centering step.