Difference between revisions of "CEE 200X Spinner"
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===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
* SOP: [https://www.seas.upenn.edu/~nanosop/CEE_200X_Spinner_SOP.htm SOP] | * SOP: [https://www.seas.upenn.edu/~nanosop/CEE_200X_Spinner_SOP.htm SOP] | ||
| − | * Video for basic tool use (6.47min):[https://www.youtube.com/watch?v=ybFHtd2pPYs | + | * Video for basic tool use (6.47min):[https://www.youtube.com/watch?v=ybFHtd2pPYs Video] |
Revision as of 13:21, 15 August 2022
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| Tool Name | Spinner - SU8/PDMS |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Eric Johnston |
| Lab Location | Soft Lithography |
| Tool Manufacturer | CEE |
| Tool Model | xxx |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | 3-9639 |
| SOP Link | SOP |
Description
Spinner for coating substrates with thicker resists as well as PDMS. Control of ramp rate and speed. Included wafer centering check.
Applications
- xxx