Difference between revisions of "Cambridge Nanotech S200 ALD"
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| − | + | {{EquipmentInfo | |
| + | | Tool_Name = Cambridge Nanotech S200 ALD | ||
| + | | image = [[Image:Nanofab_Hallway.jpeg|300px]] | ||
| + | | imagecaption = | ||
| + | | Instrument_Type = Deposition | ||
| + | | Staff_Manager = Sam | ||
| + | | Lab_Location = Bay 2 | ||
| + | | Tool_Manufacturer = Ultratech/Cambridge | ||
| + | | Tool_Model = S200 | ||
| + | | Lab_Phone = XXXXX | ||
| + | | SOP_Link = https://www.nano.upenn.edu/ | ||
| + | }} | ||
== Description == | == Description == | ||
Revision as of 11:46, 14 March 2022
 |
|
| Tool Name | Cambridge Nanotech S200 ALD |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | Sam |
| Lab Location | Bay 2 |
| Tool Manufacturer | Ultratech/Cambridge |
| Tool Model | S200 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | {{{SOP Link}}} |
Description
Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.
The QNF Savannah is capable of holding substrates of different sizes (up to 200mm). It is equipped with six precursor lines for deposition of Al2O3, HfO2, TiO2, and SiO2.