Difference between revisions of "RTA-02"
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(Created page with "Category:Thermal Processing {{EquipmentInfo | name = AET Thermal RX | Tool_Name = Rapid Thermal Annealer - 01 | image = 300px | imagecaption = | Inst...") |
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== Description == | == Description == | ||
| − | The Rapid Thermal Annealer- | + | The Rapid Thermal Annealer-02 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed. |
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| + | == Resources == | ||
| + | ===== SOP ===== | ||
| + | <pdf height="800"> File:RTA01_SOP_20240909.pdf</pdf> | ||
Revision as of 13:56, 31 January 2025
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| Tool Name | Rapid Thermal Annealer - 01 |
|---|---|
| Instrument Type | Thermal Processing |
| Staff Manager | Lucas Barreto |
| Lab Location | Bay 1 |
| Tool Manufacturer | AET |
| Tool Model | Thermal RX |
| NEMO Designation | RTA-01 |
| Lab Phone | 215-898-9736 |
| SOP Link | {{{SOP Link}}} |
Description
The Rapid Thermal Annealer-02 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.
Resources
SOP