Difference between revisions of "Amorphous silicon deposition"

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(Created page with "== Goal == The purpose of this document is to examine the etch properties of the Oxford 80 Plus RIE system and to find the etch rate of SiO2 and S1818 MicroChem positive resi...")
 
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== Results ==
 
== Results ==
 
[[Image:SiO2 etch via DE04 CHF3 O2.png |center|800px]]
 

Revision as of 14:50, 14 October 2024

Goal

The purpose of this document is to examine the etch properties of the Oxford 80 Plus RIE system and to find the etch rate of SiO2 and S1818 MicroChem positive resist.

Materials

  • SiO2

Equipment

Units

Protocol

Results