Difference between revisions of "RTA-01"
Jump to navigation
Jump to search
| Line 8: | Line 8: | ||
| Instrument_Type = Thermal Processing | | Instrument_Type = Thermal Processing | ||
| Staff_Manager = [[Lucas Barreto | Lucas Barreto]] | | Staff_Manager = [[Lucas Barreto | Lucas Barreto]] | ||
| − | | Lab_Location = Bay | + | | Lab_Location = Bay 1 |
| Tool_Manufacturer = AET | | Tool_Manufacturer = AET | ||
| Tool_Model = Thermal RX | | Tool_Model = Thermal RX | ||
Revision as of 13:30, 9 September 2024
 |
|
| Tool Name | Rapid Thermal Annealer - 01 |
|---|---|
| Instrument Type | Thermal Processing |
| Staff Manager | Lucas Barreto |
| Lab Location | Bay 1 |
| Tool Manufacturer | AET |
| Tool Model | Thermal RX |
| NEMO Designation | RTA-01 |
| Nearest Phone | 215-898-9736 |
| SOP Link | SOP |
Description
The Rapid Thermal Annealer-01 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Oxygen, Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.