Difference between revisions of "Heidelberg DWL 66+ Laser Writer"
Line 39: | Line 39: | ||
! Intensity | ! Intensity | ||
! Focus | ! Focus | ||
+ | ! # of passes | ||
! Focus mode | ! Focus mode | ||
|- | |- | ||
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| 70% | | 70% | ||
| 30 | | 30 | ||
+ | | 1 | ||
| Pneumatic | | Pneumatic | ||
|- | |- | ||
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| 90% | | 90% | ||
| 30 | | 30 | ||
+ | | 2 | ||
| Pneumatic | | Pneumatic | ||
|- | |- | ||
| IP3500 | | IP3500 | ||
| 2mm | | 2mm | ||
− | | | + | | 25% |
| 50 | | 50 | ||
| 30% | | 30% | ||
| 30 | | 30 | ||
+ | | 1 | ||
| Pneumatic | | Pneumatic | ||
|} | |} | ||
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| 28.8 | | 28.8 | ||
| 100% | | 100% | ||
− | | | + | | None |
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| 0.55 | | 0.55 | ||
| 29.5 | | 29.5 | ||
| 100% | | 100% | ||
− | | | + | | None |
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| 0.60 | | 0.60 | ||
| 30.3 | | 30.3 | ||
| 100% | | 100% | ||
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| 31.3 | | 31.3 | ||
| 100% | | 100% | ||
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| 32.3 | | 32.3 | ||
| 100% | | 100% | ||
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| 33.4 | | 33.4 | ||
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| 34.7 | | 34.7 | ||
| 100% | | 100% | ||
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| 0.85 | | 0.85 | ||
| 36.0 | | 36.0 | ||
| 100% | | 100% | ||
− | | | + | | None |
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| 0.90 | | 0.90 | ||
| 37.5 | | 37.5 | ||
| 100% | | 100% | ||
− | | | + | | None |
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| 0.95 | | 0.95 | ||
| 39.1 | | 39.1 | ||
| 100% | | 100% | ||
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| 1.00 | | 1.00 | ||
| 40.8 | | 40.8 | ||
| 100% | | 100% | ||
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| 1.05 | | 1.05 | ||
| 42.6 | | 42.6 | ||
| 100% | | 100% | ||
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| 44.5 | | 44.5 | ||
| 100% | | 100% | ||
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| 1.15 | | 1.15 | ||
| 46.5 | | 46.5 | ||
| 100% | | 100% | ||
− | | | + | | None |
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| 1.20 | | 1.20 | ||
| 48.7 | | 48.7 | ||
| 100% | | 100% | ||
− | | | + | | None |
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| 1.25 | | 1.25 | ||
| 50.9 | | 50.9 | ||
| 100% | | 100% | ||
− | | | + | | None |
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| 1.30 | | 1.30 | ||
| 53.3 | | 53.3 | ||
| 100% | | 100% | ||
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| 1.35 | | 1.35 | ||
| 55.8 | | 55.8 | ||
| 100% | | 100% | ||
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| 1.40 | | 1.40 | ||
| 58.3 | | 58.3 | ||
| 100% | | 100% | ||
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| 1.45 | | 1.45 | ||
| 61.0 | | 61.0 | ||
| 100% | | 100% | ||
− | | | + | | None |
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| 1.50 | | 1.50 | ||
| 63.8 | | 63.8 | ||
| 100% | | 100% | ||
− | | | + | | None |
|} | |} | ||
Revision as of 13:22, 6 April 2023
Tool Name | Heidelberg DWL 66+ Laser Writer |
---|---|
Instrument Type | Lithography |
Staff Manager | David Jones |
Lab Location | Bay 2 |
Tool Manufacturer | Heidelberg |
Tool Model | DWL 66+ |
NEMO Designation | {{{NEMO_Designation}}} |
Lab Phone | 8-9799 |
SOP Link | SOP |
Description
The fully automated DWL 66+ laser writing system is located inside an environment chamber for stable environment of the system with controlled laminar airflow and temperature stability. The chamber is situated on a granite base with air cushions for vibration isolation. The optical system includes highly reflective mirrors and acousto-optic modulators for real-time beam correction.
Lens & Resolution
- 2 mm lens (optical autofocus): 600 nm
- 10 mm lens (pneumatic autofocus): 2 µm
- 40 mm lens (pneumatic autofocus): 10 µm
Applications
- Patterning of photomasks
- Direct laser writing of patterns
Processes
The following exposure parameters may be used to expose photomasks.
Resist | Write Head | Filter(s) | Laser Power (mW) | Intensity | Focus | # of passes | Focus mode |
---|---|---|---|---|---|---|---|
AZ1500 | 10mm | 50% | 50 | 70% | 30 | 1 | Pneumatic |
IP3500 | 10mm | None | 50 | 90% | 30 | 2 | Pneumatic |
IP3500 | 2mm | 25% | 50 | 30% | 30 | 1 | Pneumatic |
The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) with the 10mm write head. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use.
Resist thk (µm) | Laser power (mW) | Intensity | Filter |
---|---|---|---|
0.50 | 28.8 | 100% | None |
0.55 | 29.5 | 100% | None |
0.60 | 30.3 | 100% | None |
0.65 | 31.3 | 100% | None |
0.70 | 32.3 | 100% | None |
0.75 | 33.4 | 100% | None |
0.80 | 34.7 | 100% | None |
0.85 | 36.0 | 100% | None |
0.90 | 37.5 | 100% | None |
0.95 | 39.1 | 100% | None |
1.00 | 40.8 | 100% | None |
1.05 | 42.6 | 100% | None |
1.10 | 44.5 | 100% | None |
1.15 | 46.5 | 100% | None |
1.20 | 48.7 | 100% | None |
1.25 | 50.9 | 100% | None |
1.30 | 53.3 | 100% | None |
1.35 | 55.8 | 100% | None |
1.40 | 58.3 | 100% | None |
1.45 | 61.0 | 100% | None |
1.50 | 63.8 | 100% | None |
The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) with the 2mm write head. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use.
Resist Thk (µm) | Laser Power (mW) | Intensity | Filter |
---|---|---|---|
0.5 | 24.1 | 70% | 12.5% & 25% |
0.55 | 26.4 | 70% | 12.5% & 25% |
0.6 | 28.7 | 70% | 12.5% & 25% |
0.65 | 31.0 | 70% | 12.5% & 25% |
0.7 | 33.2 | 70% | 12.5% & 25% |
0.75 | 35.5 | 70% | 12.5% & 25% |
0.8 | 37.7 | 70% | 12.5% & 25% |
0.85 | 40.0 | 70% | 12.5% & 25% |
0.9 | 42.2 | 70% | 12.5% & 25% |
0.95 | 44.4 | 70% | 12.5% & 25% |
1 | 46.6 | 70% | 12.5% & 25% |
1.05 | 48.8 | 70% | 12.5% & 25% |
1.1 | 51.0 | 70% | 12.5% & 25% |
1.15 | 53.1 | 70% | 12.5% & 25% |
1.2 | 55.3 | 70% | 12.5% & 25% |
1.25 | 57.4 | 70% | 12.5% & 25% |
1.3 | 59.6 | 70% | 12.5% & 25% |
1.35 | 61.7 | 70% | 12.5% & 25% |
1.4 | 63.8 | 70% | 12.5% & 25% |
1.45 | 65.9 | 70% | 12.5% & 25% |
1.5 | 68.0 | 70% | 12.5% & 25% |