Difference between revisions of "CEE 200X Spinner"
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| name = Spinner - SU8/PDMS | | name = Spinner - SU8/PDMS | ||
| Tool_Name = Spinner - SU8/PDMS | | Tool_Name = Spinner - SU8/PDMS | ||
| − | | image = [[Image: | + | | image = [[Image:SPN-07.png |300px]] |
| imagecaption = | | imagecaption = | ||
| Instrument_Type = Lithography | | Instrument_Type = Lithography | ||
Revision as of 14:01, 15 August 2022
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| Tool Name | Spinner - SU8/PDMS |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Eric Johnston |
| Lab Location | Soft Lithography |
| Tool Manufacturer | CEE |
| Tool Model | 200X |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | 3-9639 |
| SOP Link | SOP |
Description
Spinner for coating substrates with thicker resists as well as PDMS. Control of ramp rate and speed. Includes wafer centering step.