Difference between revisions of "Cambridge Nanotech S200 ALD"

From Quattrone Nanofabrication Facility
Jump to navigation Jump to search
Line 20: Line 20:
  
 
The QNF Savannah ALD is capable of holding substrates of different sizes (up to 200mm). The system is equipped with six precursor lines for deposition of Al2O3, HfO2, TiO2, and SiO2.
 
The QNF Savannah ALD is capable of holding substrates of different sizes (up to 200mm). The system is equipped with six precursor lines for deposition of Al2O3, HfO2, TiO2, and SiO2.
 +
 +
===== Applications =====
 +
* Aluminum oxide deposition
 +
* Silicon dioxide deposition
 +
* Titanium oxide deposition
 +
* Hafnium oxide deposition
 +
* Deposition of other films can be made available upon request
 +
 +
===== Allowed material in ALD System =====
 +
* Si, Si<sub>x</sub>N<sub>y</sub>, SiO<sub>2</sub>, SOI
 +
* Hard masks compatible with process temperature

Revision as of 12:03, 14 March 2022


Cambridge Nanotech S200 ALD
ALD-01.jpeg
Tool Name Cambridge Nanotech S200 ALD
Instrument Type Deposition
Staff Manager Sam Azadi
Lab Location Bay 2
Tool Manufacturer Ultratech/Cambridge
Tool Model S200
NEMO Designation {{{NEMO_Designation}}}
Lab Phone XXXXX
SOP Link SOP

Description

The QNF Savannah ALD is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on ultra high aspect ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.

The QNF Savannah ALD is capable of holding substrates of different sizes (up to 200mm). The system is equipped with six precursor lines for deposition of Al2O3, HfO2, TiO2, and SiO2.

Applications
  • Aluminum oxide deposition
  • Silicon dioxide deposition
  • Titanium oxide deposition
  • Hafnium oxide deposition
  • Deposition of other films can be made available upon request
Allowed material in ALD System
  • Si, SixNy, SiO2, SOI
  • Hard masks compatible with process temperature