Difference between revisions of "Amorphous silicon deposition"

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== Materials ==
 
== Materials ==
* SiO<sub>2</sub>
+
* 250 nm SiO<sub>2</sub> on Si wafer.
  
 
== Equipment ==
 
== Equipment ==

Revision as of 13:53, 14 October 2024

Goal

Determine the a-Si deposition rate on CVD-01


Materials

  • 250 nm SiO2 on Si wafer.

Equipment

Units

Protocol

Results