Difference between revisions of "RTA-01"

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| image = [[Image:RTA01.jpg|300px]]
 
| image = [[Image:RTA01.jpg|300px]]
 
| imagecaption =  
 
| imagecaption =  
| Instrument_Type = Deposition
+
| Instrument_Type = Thermal Processing
 
| Staff_Manager = [[Lucas Barreto | Lucas Barreto]]
 
| Staff_Manager = [[Lucas Barreto | Lucas Barreto]]
 
| Lab_Location = Bay 2
 
| Lab_Location = Bay 2

Revision as of 13:27, 9 September 2024


AET Thermal RX
RTA01.jpg
Tool Name Rapid Thermal Annealer - 01
Instrument Type Thermal Processing
Staff Manager Lucas Barreto
Lab Location Bay 2
Tool Manufacturer AET
Tool Model Thermal RX
NEMO Designation RTA-01
Lab Phone 215-898-9736
SOP Link SOP

Description

The Rapid Thermal Annealer-01 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Oxygen, Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.


Resources