Difference between revisions of "RTA-01"

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The Rapid Thermal Annealer-01 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Oxygen, Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.  
 
The Rapid Thermal Annealer-01 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Oxygen, Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.  
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== Resources ==
 
== Resources ==

Revision as of 13:08, 9 September 2024


AET Thermal RX
CVD-02.jpeg
Tool Name Rapid Thermal Annealer - 01
Instrument Type Deposition
Staff Manager Lucas Barreto
Lab Location Bay 2
Tool Manufacturer AET
Tool Model Thermal RX
NEMO Designation RTA-01
Lab Phone 215-898-9736
SOP Link SOP

Description

The Rapid Thermal Annealer-01 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Oxygen, Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.


Resources