Difference between revisions of "Raith EBPG5200+ E-Beam Lithography System"

From Quattrone Nanofabrication Facility
Jump to navigation Jump to search
Line 2: Line 2:
  
 
{{EquipmentInfo
 
{{EquipmentInfo
| name = Raith EBPG5200+ E-Beam Lithography System
+
| name = Raith EBPG5200+ EBL
 
| Tool_Name = Raith EBPG5200+ E-Beam Lithography System
 
| Tool_Name = Raith EBPG5200+ E-Beam Lithography System
 
| image = [[Image:EBL-03.jpg|300px]]
 
| image = [[Image:EBL-03.jpg|300px]]

Revision as of 16:47, 22 November 2023


Raith EBPG5200+ EBL
EBL-03.jpg
Tool Name Raith EBPG5200+ E-Beam Lithography System
Instrument Type Lithography
Staff Manager David Barth
Lab Location Bay 4
Tool Manufacturer Raith
Tool Model EBPG5200+
NEMO Designation {{{NEMO_Designation}}}
Lab Phone 8-9799
SOP Link SOP

Description

The Raith EBPG5200+ is an electron beam lithography tool capable of high resolution patterning at 100 kV. It has a 125 MHz pattern generator, a maximum current of 350 nA, and a 1 mm mainfield size. It has an automatic aperture changer, automatic and dynamic focus and stigmation, and automatic alignment. The EBPG can achieve linewidths <8nm with stitching and overlay accuracy better than 10nm.


Applications
  • Large scale, high speed patterning of positive and negative e-beam resists with features from <10 nm to micron/mm scale
Allowed Materials
  • Standard semiconductor materials
  • Low vapor pressure metals
  • Resists

Resources

SOPs & Troubleshooting
Resist and Process Data