Difference between revisions of "Raith EBPG5200+ E-Beam Lithography System"
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| name = Raith EBPG5200+ E-Beam Lithography System | | name = Raith EBPG5200+ E-Beam Lithography System | ||
| Tool_Name = Raith EBPG5200+ E-Beam Lithography System | | Tool_Name = Raith EBPG5200+ E-Beam Lithography System | ||
| − | | image = [[Image:EBL-03. | + | | image = [[Image:EBL-03.jpg|300px]] |
| imagecaption = | | imagecaption = | ||
| Instrument_Type = Lithography | | Instrument_Type = Lithography | ||
Revision as of 15:45, 22 November 2023
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| Tool Name | Raith EBPG5200+ E-Beam Lithography System |
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| Instrument Type | Lithography |
| Staff Manager | David Barth |
| Lab Location | Bay 4 |
| Tool Manufacturer | Raith |
| Tool Model | EBPG5200+ |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | 8-9799 |
| SOP Link | SOP |
Description
The Raith EBPG5200+ is an electron beam lithography tool capable of high resolution patterning at 100 kV. It has a 125 MHz pattern generator, a maximum current of 350 nA, and a 1 mm mainfield size. It has an automatic aperture changer, automatic and dynamic focus and stigmation, and automatic alignment. The EBPG can achieve linewidths <8nm with stitching and overlay accuracy better than 10nm.
Applications
- Large scale, high speed patterning of positive and negative e-beam resists with features from <10 nm to micron/mm scale
Allowed Materials
- Standard semiconductor materials
- Low vapor pressure metals
- Resists