Difference between revisions of "Fiji G2 ALD"

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| Instrument_Type = Deposition
 
| Instrument_Type = Deposition
 
| Staff_Manager = [[Sam Azadi | Sam Azadi]]
 
| Staff_Manager = [[Sam Azadi | Sam Azadi]]
| Lab_Location = Bay 2
+
| Lab_Location = Removed
 
| Tool_Manufacturer = Veeco
 
| Tool_Manufacturer = Veeco
 
| Tool_Model = Fiji G2
 
| Tool_Model = Fiji G2
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| SOP Link = [https://repository.upenn.edu/scn_sop/6/ SOP]
 
| SOP Link = [https://repository.upenn.edu/scn_sop/6/ SOP]
 
}}
 
}}
 +
 +
'''ALD-02 is no longer available'''
  
 
== Description ==
 
== Description ==
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===== Films =====
 
===== Films =====
[[ALD-01: Titanium Oxide Deposition | Titanium Oxide Deposition]]
+
[[ALD-02: Titanium Oxide Deposition | Titanium Dioxide Deposition ]]
  
 
Al2O3
 
Al2O3
  
 
ZnO
 
ZnO

Latest revision as of 13:52, 15 January 2025


Veeco Fiji G2
ALD-03.jpeg
Tool Name Veeco Fiji G2
Instrument Type Deposition
Staff Manager Sam Azadi
Lab Location Removed
Tool Manufacturer Veeco
Tool Model Fiji G2
NEMO Designation ALD-02
Lab Phone 215-898-9736
SOP Link SOP

ALD-02 is no longer available

Description

Fiji is a plasma and thermal ALD equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Fiji is capable of holding substrates of different sizes up to 200mm. The Fiji thin film deposition system is equipped with TMA, DEZ, and water.

Films

Titanium Dioxide Deposition

Al2O3

ZnO