Difference between revisions of "CEE 200X Spinner"
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| − | + | [[Category:Soft Lithography]] | |
| + | |||
| + | {{EquipmentInfo | ||
| + | | name = Spinner - SU8/PDMS | ||
| + | | Tool_Name = Spinner - SU8/PDMS | ||
| + | | image = [[Image:MA-03.jpeg |300px]] | ||
| + | | imagecaption = | ||
| + | | Instrument_Type = Lithography | ||
| + | | Staff_Manager = Eric Johnston | ||
| + | | Lab_Location = Soft Lithography | ||
| + | | Tool_Manufacturer = CEE | ||
| + | | Tool_Model = xxx | ||
| + | | Iris_Designation = SPN-07 | ||
| + | | Lab_Phone = 3-9639 | ||
| + | | SOP Link = [https://repository.upenn.edu/scn_sop/10/ SOP] | ||
| + | }} | ||
| + | |||
| + | == Description == | ||
| + | Spinner for coating substrates with thicker resists as well as PDMS. Control of ramp rate and speed. Included wafer centering check. | ||
| + | |||
| + | ===== Applications ===== | ||
| + | * xxx | ||
| + | |||
| + | |||
| + | |||
| + | == Resources == | ||
| + | |||
| + | ===== SOPs & Troubleshooting ===== | ||
| + | * SOP: [https://www.seas.upenn.edu/~nanosop/CEE_200X_Spinner_SOP.htm SOP] | ||
| + | * Video for basic tool use (6.47min):[https://www.youtube.com/watch?v=ybFHtd2pPYs | Video] | ||
Revision as of 13:20, 15 August 2022
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| Tool Name | Spinner - SU8/PDMS |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | Eric Johnston |
| Lab Location | Soft Lithography |
| Tool Manufacturer | CEE |
| Tool Model | xxx |
| NEMO Designation | {{{NEMO_Designation}}} |
| Nearest Phone | 3-9639 |
| SOP Link | SOP |
Description
Spinner for coating substrates with thicker resists as well as PDMS. Control of ramp rate and speed. Included wafer centering check.
Applications
- xxx