Difference between revisions of "Heidelberg DWL 66+ Laser Writer"
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| Tool_Model = DWL 66+ | | Tool_Model = DWL 66+ | ||
| Iris_Designation = LW-01 | | Iris_Designation = LW-01 | ||
| − | | Lab_Phone = | + | | Lab_Phone = Bay 4 |
| SOP Link = [https://www.seas.upenn.edu/~nanosop/Photomask_Writer.htm SOP] | | SOP Link = [https://www.seas.upenn.edu/~nanosop/Photomask_Writer.htm SOP] | ||
}} | }} | ||
Revision as of 09:08, 31 March 2022
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| Tool Name | Heidelberg DWL 66+ Laser Writer |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | David Jones |
| Lab Location | Bay 2 |
| Tool Manufacturer | Heidelberg |
| Tool Model | DWL 66+ |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | Bay 4 |
| SOP Link | SOP |
Description
The fully automated DWL 66+ laser writing system is located inside an environment chamber for stable environment of the system with controlled laminar airflow and temperature stability. The chamber is situated on a granite base with air cushions for vibration isolation. The optical system includes highly reflective mirrors and acousto-optic modulators for real-time beam correction.
Lens & Resolution
- 2 mm lens (optical autofocus): 600 nm
- 10 mm lens (pneumatic autofocus): 2 µm
- 40 mm lens (pneumatic autofocus): 10 µm
Applications
- Patterning of photomasks
- Direct laser writing of patterns