Difference between revisions of "ABM Mask Aligner"

**ABM Mask Aligner**
Tool Name	ABM Mask Aligner
Instrument Type	Lithography
Staff Manager	Ana Cohen
Lab Location	Bay 6
Tool Manufacturer	ABM
Tool Model
NEMO Designation	MA-03
Lab Phone	xxxxx
SOP Link	SOP

Revision as of 11:48, 29 April 2025

Description

The ABM Mask Aligner is a manual and versatile mask aligner with top-side alignment and substrate capabilities from 100mm down to small pieces. Requires a 5" mask or 5" glass plate with film mask.

Applications

Tool is used primarily for SU8 exposure. It can also be used for aligning PDMS components for PDMS-to-PDMS bonding.

Exposure time = dose (mJ/cm^2) / intensity (mW/cm^2) Dose can be determined from the resist data sheet. See table below for intensities.

To obtain vertical sidewalls with a Cr glass mask, use the long pass filter (PL-360-LP) which eliminates UV emission below 350nm. Do not use with film masks. Inherent defects in film masks will be accentuated, resulting in worse results.

NO MASK	~10 mW/cm^2	100% of output
GLASS MASK	~9 mW/cm^2	87.5%
GLASS + FILM MASK	~7 mW/cm^2	68.5%
GLASS + LP FILTER	~5 mW/cm^2	47.0%
GLASS + FILM + LP FILTER	~4 mW/cm^2	37.0%

More information about Soft Lithography processing can be found under Process Resources

Resources

MA-01 to MA-03 Calculator

SOPs & Troubleshooting

SOP
Video - Standard procedure for previous model *good overview, note slight differences*
Video - Alignment Marks

@@ Line 31: / Line 31: @@
 |-
 | NO MASK
-| 20 mW/cm^2
+| ~10 mW/cm^2
 | 100% of output
 |-
 | GLASS MASK
-| 17.5 mW/cm^2
+| ~9 mW/cm^2
 | 87.5%
 |-
 | GLASS + FILM MASK
-| 13.7 mW/cm^2
+| ~7 mW/cm^2
 | 68.5%
 |-
 | GLASS + LP FILTER
-| 9.4 mW/cm^2
+| ~5 mW/cm^2
 | 47.0%
 |-
 | GLASS + FILM + LP FILTER
-| 7.4 mW/cm^2
+| ~4 mW/cm^2
 | 37.0%
 |}