Difference between revisions of "ABM Mask Aligner"
(Created page with "Category:Soft Lithography {{EquipmentInfo | name = ABM Mask Aligner | Tool_Name = ABM Mask Aligner | image = | imagecaption = | Instrument_Type = Lithography | Staff_Ma...") |
|||
Line 13: | Line 13: | ||
| NEMO_Designation = MA-03 | | NEMO_Designation = MA-03 | ||
| Lab_Phone = xxxxx | | Lab_Phone = xxxxx | ||
− | | SOP Link = | + | | SOP Link = [https://nemo.nano.upenn.edu/media/tool_documents/ma-03-abm-mask-aligner/MA-03_SOP_v01.pdf SOP] |
}} | }} | ||
Line 59: | Line 59: | ||
===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
− | * | + | * [https://nemo.nano.upenn.edu/media/tool_documents/ma-03-abm-mask-aligner/MA-03_SOP_v01.pdf SOP] |
− | * | + | * [https://www.youtube.com/watch?v=cRzLljt0VLs Video - Standard procedure for previous model] *good overview, note slight differences* |
− | * | + | * [https://www.youtube.com/watch?v=Q1DvZBQgKhI&list=PLiihbHV9HgpX_9m5Khz2wn-XaxM5-yErU&index=16 Video -(LayoutEditor - negative resist alignment marks)] |
Revision as of 16:46, 28 April 2025
Tool Name | ABM Mask Aligner |
---|---|
Instrument Type | Lithography |
Staff Manager | Ana Cohen |
Lab Location | Bay 6 |
Tool Manufacturer | ABM |
Tool Model | |
NEMO Designation | MA-03 |
Lab Phone | xxxxx |
SOP Link | SOP |
Description
The ABM Mask Aligner is a manual and versatile mask aligner with top-side alignment and substrate capabilities from 100mm down to small pieces. Requires a 5" mask or 5" glass plate with film mask.
Applications
Tool is used primarily for SU8 exposure. It can also be used for aligning PDMS components for PDMS-to-PDMS bonding.
Exposure time = dose (mJ/cm^2) / intensity (mW/cm^2) Dose can be determined from the resist data sheet. See table below for intensities.
To obtain vertical sidewalls with a Cr glass mask, use the long pass filter (PL-360-LP) which eliminates UV emission below 350nm. Do not use with film masks. Inherent defects in film masks will be accentuated, resulting in worse results.
NO MASK | 20 mW/cm^2 | 100% of output |
GLASS MASK | 17.5 mW/cm^2 | 87.5% |
GLASS + FILM MASK | 13.7 mW/cm^2 | 68.5% |
GLASS + LP FILTER | 9.4 mW/cm^2 | 47.0% |
GLASS + FILM + LP FILTER | 7.4 mW/cm^2 | 37.0% |
More information about Soft Lithography processing can be found under Process Resources
Resources
MA-01 to MA-03 Calculator
SOPs & Troubleshooting
- SOP
- Video - Standard procedure for previous model *good overview, note slight differences*
- Video -(LayoutEditor - negative resist alignment marks)