Difference between revisions of "ABM Mask Aligner"

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(Created page with "Category:Soft Lithography {{EquipmentInfo | name = ABM Mask Aligner | Tool_Name = ABM Mask Aligner | image = | imagecaption = | Instrument_Type = Lithography | Staff_Ma...")
 
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| NEMO_Designation = MA-03
 
| NEMO_Designation = MA-03
 
| Lab_Phone = xxxxx
 
| Lab_Phone = xxxxx
| SOP Link =   
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| SOP Link =  [https://nemo.nano.upenn.edu/media/tool_documents/ma-03-abm-mask-aligner/MA-03_SOP_v01.pdf  SOP]
 
}}
 
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===== SOPs & Troubleshooting =====
 
===== SOPs & Troubleshooting =====
* SOP: [ SOP]
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* [https://nemo.nano.upenn.edu/media/tool_documents/ma-03-abm-mask-aligner/MA-03_SOP_v01.pdf SOP]
* Video for basic tool use (no audio, 5.52min):[https://www.youtube.com/watch?v=cRzLljt0VLs Basic Video]
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* [https://www.youtube.com/watch?v=cRzLljt0VLs Video - Standard procedure for previous model] *good overview, note slight differences*
* Video (LayoutEditor - negative resist alignment marks): [https://www.youtube.com/watch?v=Q1DvZBQgKhI&list=PLiihbHV9HgpX_9m5Khz2wn-XaxM5-yErU&index=16 Video]
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* [https://www.youtube.com/watch?v=Q1DvZBQgKhI&list=PLiihbHV9HgpX_9m5Khz2wn-XaxM5-yErU&index=16 Video -(LayoutEditor - negative resist alignment marks)]

Revision as of 16:46, 28 April 2025


ABM Mask Aligner
Tool Name ABM Mask Aligner
Instrument Type Lithography
Staff Manager Ana Cohen
Lab Location Bay 6
Tool Manufacturer ABM
Tool Model
NEMO Designation MA-03
Lab Phone xxxxx
SOP Link SOP

Description

The ABM Mask Aligner is a manual and versatile mask aligner with top-side alignment and substrate capabilities from 100mm down to small pieces. Requires a 5" mask or 5" glass plate with film mask.

Applications

Tool is used primarily for SU8 exposure. It can also be used for aligning PDMS components for PDMS-to-PDMS bonding.

Exposure time = dose (mJ/cm^2) / intensity (mW/cm^2) Dose can be determined from the resist data sheet. See table below for intensities.

To obtain vertical sidewalls with a Cr glass mask, use the long pass filter (PL-360-LP) which eliminates UV emission below 350nm. Do not use with film masks. Inherent defects in film masks will be accentuated, resulting in worse results.

NO MASK 20 mW/cm^2 100% of output
GLASS MASK 17.5 mW/cm^2 87.5%
GLASS + FILM MASK 13.7 mW/cm^2 68.5%
GLASS + LP FILTER 9.4 mW/cm^2 47.0%
GLASS + FILM + LP FILTER 7.4 mW/cm^2 37.0%

More information about Soft Lithography processing can be found under Process Resources

Resources

MA-01 to MA-03 Calculator
SOPs & Troubleshooting