Difference between revisions of "Heidelberg DWL 66+ Laser Writer"

**Heidelberg DWL 66+ Laser Writer**
Tool Name	Heidelberg DWL 66+ Laser Writer
Instrument Type	Lithography
Staff Manager	Ana Cohen
Lab Location	Bay 4
Tool Manufacturer	Heidelberg
Tool Model	DWL 66+
NEMO Designation	LW-01
Lab Phone	8-9799
SOP Link	SOP

Latest revision as of 18:41, 28 October 2024

Description

The fully automated DWL 66+ laser writing system is located inside an environment chamber for stable environment of the system with controlled laminar airflow and temperature stability. The chamber is situated on a granite base with air cushions for vibration isolation. The optical system includes highly reflective mirrors and acousto-optic modulators for real-time beam correction. The laser is 405nm wavelength (h-line).

Lens & Resolution

2 mm lens (optical autofocus): 600 nm
10 mm lens (pneumatic autofocus): 2 µm
40 mm lens (pneumatic autofocus): 10 µm

Applications

Patterning of photomasks
Direct laser writing on substrates, from 6" wafers down to 10mm x 10mm pieces

Allowed Materials

Mask Plates -- available in the QNF Stockroom pre-coated with AZ1500 and IP3500
Resists -- must be compatible with h-line exposure

Processes

The following exposure parameters may be used to expose photomasks.

Resist	Write Head	Filter(s)	Laser Power (mW)	Intensity	Focus	# of passes	Focus mode
AZ1500	10mm	25%	70	50%	-30	1	Pneumatic
IP3500	10mm	NONE	70	50%	-30	1	Pneumatic
AZ1500	2mm	12.5%+25%+50%	60	50%	-15	1	Pneumatic
IP3500	2mm	12.5%+25%	60	50%	-15	1	Pneumatic

The following exposure parameters may be used to direct write into S18xx resist on silicon (soft baked at 115C for 60s, development in TMAH 0.26N for 60s). For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use. [May not be up-to-date. It is always a good idea to check your resist thickness and run a dose test to confirm optimal parameters.]

Resist	Spin Speed (RPM)	Write Head	Filter(s)	Laser Power (mW)	Intensity	# passes	Focus mode
S1805	3000	10mm	12.5%	105	60%	1	pneumatic
S1805	3000	2mm	1% & 50%	TBD	TBD	1	pneumatic
KL5315	5000	10mm	50%	TBD	TBD	1	pneumatic
KL5315	5000	2mm	1%	TBD	TBD	1	pneumatic
S1818	3000	10mm	NONE	65	60%	1	pneumatic
S1818	3000	2mm	12.5% & 25%	TBD	TBD	1	pneumatic

  
 S1818 at 3000rpm (2.2um thickness) with 10mm writehead [Feb 2024]
 65mW, NO Filter, 70% intensity, + 20 focus
 5um, 10um, 25um, and 50um line widths after 60s TMAH 0.26N development

Resources

SOPs & Troubleshooting

@@ Line 8: / Line 8: @@
 | Instrument_Type = Lithography
 | Staff_Manager = [[Ana Cohen | Ana Cohen]]
-| Lab_Location = Bay 2
+| Lab_Location = Bay 4
 | Tool_Manufacturer = Heidelberg
 | Tool_Model = DWL 66+
 | NEMO_Designation = LW-01
 | Lab_Phone = 8-9799
-| SOP Link = [https://repository.upenn.edu/scn_protocols/76/ SOP]
+| SOP Link = [https://nemo.nano.upenn.edu/media/tool_documents/lw-01-heidelberg-dwl66/LW-01_SOP_v02.pdf SOP]
 }}
@@ Line 29: / Line 29: @@
 ===== Allowed Materials =====
-* Mask Plates -- available in the QNF Stockroom pre-coated with AZ1500 and IP3500
+* Mask Plates -- available in the [https://nemo.nano.upenn.edu/stockroom/ QNF Stockroom] pre-coated with AZ1500 and IP3500
 * Resists -- must be compatible with h-line exposure
-** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#QNF_Supplied_Standard_Photoresists S1800 series]
+** [[Resists_at_QNF#QNF_Supplied_Standard_Photoresists | S1800 series]]
-** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#Miscellaneous KL5300 series]
+** [[Resists_at_QNF#Miscellaneous | KL5300 series]]
-** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#Other_Resists LOR]
+** [[Resists_at_QNF#Other_Resists | LOR]]
 == Processes ==
-The following exposure parameters may be used to expose photomasks. (Updated Feb 15, 2024)
+The following exposure parameters may be used to expose photomasks. <em>  </em>
 {| class="wikitable" style="vertical-align:bottom;"
 |-
@@ Line 51: / Line 51: @@
 | 10mm
 | 25%
-| 60
+| 70
-| 70%
+| 50%
-| +20
+| -30
 | 1
 | Pneumatic
@@ Line 60: / Line 60: @@
 | 10mm
 | NONE
+| 70
+| 50%
+| -30
+| 1
+| Pneumatic
+|-
+| AZ1500
+| 2mm
+| 12.5%+25%+50%
 | 60
-| 70%
+| 50%
-| +20
+| -15
 | 1
 | Pneumatic
@@ Line 68: / Line 77: @@
 | IP3500
 | 2mm
-| 25% & 12.5%
+| 12.5%+25%
 | 60
 | 50%
-| 0
+| -15
 | 1
 | Pneumatic
@@ Line 95: / Line 104: @@
 | 12.5%
 | 105
-| 70%
+| 60%
 | 1
 | pneumatic
@@ Line 103: / Line 112: @@
 | 2mm
 | 1% & 50%
-| 105
+| TBD
-| 100%
+| TBD
 | 1
 | pneumatic
@@ Line 112: / Line 121: @@
 | 10mm
 | 50%
-| 105
+| TBD
-| 40%
+| TBD
 | 1
 | pneumatic
@@ Line 121: / Line 130: @@
 | 2mm
 | 1%
-| 75
+| TBD
-| 100%
+| TBD
 | 1
 | pneumatic
@@ Line 131: / Line 140: @@
 | NONE
 | 65
-| 70%
+| 60%
 | 1
 | pneumatic
@@ Line 139: / Line 148: @@
 | 2mm
 | 12.5% & 25%
-| 60
+| TBD
-| 60%
+| TBD
 | 1
 | pneumatic
@@ Line 158: / Line 167: @@
 ===== SOPs & Troubleshooting =====
-* [https://repository.upenn.edu/scn_protocols/76/ SOP]
+* [https://nemo.nano.upenn.edu/media/tool_documents/lw-01-heidelberg-dwl66/LW-01_SOP_v02.pdf SOP]
 * [https://www.youtube.com/watch?v=q_mvEGSCEGI&list=PLiihbHV9HgpWAcmgdpMGBkejcBhEzoKJO Videos - LW-01 Tool Training]
 * [https://drive.google.com/file/d/1MUMPdLl4GfXtmg3gJjdiPKbdiyCq-elM/view?usp=drive_link Video - Chuck Installation/Removal]