Difference between revisions of "Amorphous silicon deposition"
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(Created page with "== Goal == The purpose of this document is to examine the etch properties of the Oxford 80 Plus RIE system and to find the etch rate of SiO2 and S1818 MicroChem positive resi...") |
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== Goal == | == Goal == | ||
| + | Determine the a-Si deposition rate on CVD-01 | ||
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== Materials == | == Materials == | ||
| − | * SiO<sub>2</sub> | + | * 250 nm SiO<sub>2</sub> on Si. |
== Equipment == | == Equipment == | ||
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== Results == | == Results == | ||
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Latest revision as of 13:54, 14 October 2024
Goal
Determine the a-Si deposition rate on CVD-01
Materials
- 250 nm SiO2 on Si.