Difference between revisions of "IntlVac NanoQuest 1 IBE"
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(Created page with "Category:Etch {{EquipmentInfo | name = IntlVac Nanoquest 1 | Tool_Name = IntlVac IBE | image = 300px | imagecaption = | Instrument_Type = Etch | St...") |
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| name = IntlVac Nanoquest 1 | | name = IntlVac Nanoquest 1 | ||
| Tool_Name = IntlVac IBE | | Tool_Name = IntlVac IBE | ||
| − | | image = [[ | + | | image = [[]] |
| imagecaption = | | imagecaption = | ||
| Instrument_Type = Etch | | Instrument_Type = Etch | ||
| Line 17: | Line 17: | ||
== Description == | == Description == | ||
| − | + | NanoQuest 1 is an ion miller connected to Ar gas and capable of etch small mm-scale samples up to full 4" wafers. The tool is equipped with a secondary ion mass spectroscopy (SIMS) unit and is capable of etch with manual endpoint detection. The stage has a tilt motor that allows for etch angles between 0 (directly facing the beam) and 90 degrees (parallel to the beam). | |
The tool in QNF is connected to Ar gas and can etch samples up to 4" wafer. | The tool in QNF is connected to Ar gas and can etch samples up to 4" wafer. | ||
| + | Available beam voltages are: 300 V, 400 V, 450 V, and 500 V | ||
===== Applications ===== | ===== Applications ===== | ||
* Ion milling | * Ion milling | ||
| + | == Resources == | ||
| + | [https://www.youtube.com/watch?v=1GsWXfCUXUg manual loading/unloading operation video] | ||
| − | == | + | == Standard Process Information == |
| + | |||
| + | {| class="wikitable" | ||
| + | |- | ||
| + | ! Material || Voltage [V] || tilt [degree] || Etch Rate [nm/min] | ||
| + | |- | ||
| + | | [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 300 || 0 || 15 | ||
| + | |- | ||
| + | | [[ Oxford PlasmaLab 100 PECVD | ''' SiO<sub>2<sub>''']] || 500 || 0 || 40 | ||
| + | |} | ||
| − | + | ==== Process information from user community ==== | |
| + | {| class="wikitable" | ||
| + | |- | ||
| + | ! Material || Voltage [V] || tilt [degree] || Etch Rate [nm/min] | ||
| + | |- | ||
| + | | Al || 400 || 45 || 60 | ||
| + | |- | ||
| + | | Al || 500 || 45 || 100 | ||
| + | |- | ||
| + | | AlScN || 500 || 45 || 43 | ||
| + | |- | ||
| + | | Pt || 500 || 45 || 20 | ||
| + | |- | ||
| + | | LiNbO3 || 500 || 0 || 40 | ||
| + | |} | ||
===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
Latest revision as of 11:40, 3 October 2024
| [[]] | |
| Tool Name | IntlVac IBE |
|---|---|
| Instrument Type | Etch |
| Staff Manager | Sam Azadi |
| Lab Location | Bay 2 |
| Tool Manufacturer | IntlVac |
| Tool Model | Nanoquest 1 |
| NEMO Designation | DE-01 |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
NanoQuest 1 is an ion miller connected to Ar gas and capable of etch small mm-scale samples up to full 4" wafers. The tool is equipped with a secondary ion mass spectroscopy (SIMS) unit and is capable of etch with manual endpoint detection. The stage has a tilt motor that allows for etch angles between 0 (directly facing the beam) and 90 degrees (parallel to the beam).
The tool in QNF is connected to Ar gas and can etch samples up to 4" wafer. Available beam voltages are: 300 V, 400 V, 450 V, and 500 V
Applications
- Ion milling
Resources
manual loading/unloading operation video
Standard Process Information
| Material | Voltage [V] | tilt [degree] | Etch Rate [nm/min] |
|---|---|---|---|
| SiO2 | 300 | 0 | 15 |
| SiO2 | 500 | 0 | 40 |
Process information from user community
| Material | Voltage [V] | tilt [degree] | Etch Rate [nm/min] |
|---|---|---|---|
| Al | 400 | 45 | 60 |
| Al | 500 | 45 | 100 |
| AlScN | 500 | 45 | 43 |
| Pt | 500 | 45 | 20 |
| LiNbO3 | 500 | 0 | 40 |