Difference between revisions of "Intlvac E-beam Evaporator"
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===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
| − | * [https://upenn. | + | * [https://nemo.nano.upenn.edu/media/tool_documents/pvd-09-intlvac-evap/PVD09_SOP_v01.docx.pdf PVD-09 SOP] |
Latest revision as of 15:39, 17 September 2024
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| Tool Name | Intlvac E-Beam Evaporator |
|---|---|
| Instrument Type | Physical vapor deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | Intlvac |
| Tool Model | Nanochrome |
| NEMO Designation | PVD-09 |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
The tool
The IntlVac Electron Beam Evaporator has a base process chamber pressure in the low e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces.
Available materials
The tool contains the following materials:
- Al - Aluminum
- Ti - Titanium