Difference between revisions of "RTA-01"
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== Resources == | == Resources == | ||
+ | ===== SOP ===== | ||
+ | <pdf height="800"> File:EBPG5200+ SOP.pdf</pdf> |
Revision as of 13:40, 9 September 2024
Tool Name | Rapid Thermal Annealer - 01 |
---|---|
Instrument Type | Thermal Processing |
Staff Manager | Lucas Barreto |
Lab Location | Bay 1 |
Tool Manufacturer | AET |
Tool Model | Thermal RX |
NEMO Designation | RTA-01 |
Lab Phone | 215-898-9736 |
SOP Link | SOP |
Description
The Rapid Thermal Annealer-01 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Oxygen, Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.
Resources
SOP