Difference between revisions of "RTA-01"
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| image = [[Image:RTA01.jpg|300px]] | | image = [[Image:RTA01.jpg|300px]] | ||
| imagecaption = | | imagecaption = | ||
| − | | Instrument_Type = | + | | Instrument_Type = Thermal Processing |
| Staff_Manager = [[Lucas Barreto | Lucas Barreto]] | | Staff_Manager = [[Lucas Barreto | Lucas Barreto]] | ||
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
Revision as of 14:27, 9 September 2024
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| Tool Name | Rapid Thermal Annealer - 01 |
|---|---|
| Instrument Type | Thermal Processing |
| Staff Manager | Lucas Barreto |
| Lab Location | Bay 2 |
| Tool Manufacturer | AET |
| Tool Model | Thermal RX |
| NEMO Designation | RTA-01 |
| Lab Phone | 215-898-9736 |
| SOP Link | SOP |
Description
The Rapid Thermal Annealer-01 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Oxygen, Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips. Only MOS-compatible materials are allowed. Compound semiconductors and metals are not allowed.