Difference between revisions of "How PVD works"
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Physical vapor deposition (PVD) is a thin film deposition technique used to create coatings or thin films on substrates in a variety of industries, including semiconductor, optics, aerospace, and automotive. In PVD, material is transferred from a solid (target/source) to a substrate in a vacuum environment, without going through a liquid phase. | Physical vapor deposition (PVD) is a thin film deposition technique used to create coatings or thin films on substrates in a variety of industries, including semiconductor, optics, aerospace, and automotive. In PVD, material is transferred from a solid (target/source) to a substrate in a vacuum environment, without going through a liquid phase. | ||
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+ | == Basics of PVD == |
Revision as of 10:48, 4 April 2024
Physical vapor deposition (PVD) is a thin film deposition technique used to create coatings or thin films on substrates in a variety of industries, including semiconductor, optics, aerospace, and automotive. In PVD, material is transferred from a solid (target/source) to a substrate in a vacuum environment, without going through a liquid phase.