View source for What is Chemical Vapor Deposition (CVD)?

Chemical Vapor Deposition (CVD) is a thin-film deposition technique in which thin films are deposited onto a substrate surface through the chemical reaction of vapor-phase precursor molecules.

The basic process involves the following steps:

#'''Precursor Delivery:''' Precursor gases (or vapors) are introduced into a reaction chamber containing the substrate material.
#'''Chemical Reaction:''' The precursor molecules react with the substrate surface or with other reactive species present in the chamber, leading to the deposition of a thin film of material on the substrate.
#'''Film Growth:''' The deposited material grows on the substrate surface as the chemical reaction continues. The growth rate can be controlled by adjusting parameters such as precursor flow rate, temperature, and pressure.
#'''Evacuation:''' Any unreacted precursor gases, reaction byproducts, and excess materials are removed from the chamber through evacuation or purging.

CVD offers a wide range of materials growth possibilities and provides:
* Excellent film uniformity and conformity.
* Scalability for large-area deposition.
* Compatibility with various substrate materials.

Click on the link below for an excellent introductory CVD video on YouTube.

* [https://www.youtube.com/watch?v=pZuhK3jsMMY| Chemical Vapor Deposition]