Difference between revisions of "Process Resources"
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* [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation] | * [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation] | ||
| − | = | + | = Lithography = |
* [[Resists at QNF]] | * [[Resists at QNF]] | ||
Revision as of 09:55, 11 May 2023
General Process Documents
Lithography
Film Characterization
- Deposition and Etch Characterization of LPCVD SiNx thin films
- ALD deposition of SiO2 using BDEAS and Ozone precursors