Difference between revisions of "Heidelberg DWL 66+ Laser Writer"

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Revision as of 14:15, 10 October 2023


Heidelberg DWL 66+ Laser Writer
LW-01.jpeg
Tool Name Heidelberg DWL 66+ Laser Writer
Instrument Type Lithography
Staff Manager David Jones
Lab Location Bay 2
Tool Manufacturer Heidelberg
Tool Model DWL 66+
NEMO Designation {{{NEMO_Designation}}}
Lab Phone 8-9799
SOP Link SOP

Description

The fully automated DWL 66+ laser writing system is located inside an environment chamber for stable environment of the system with controlled laminar airflow and temperature stability. The chamber is situated on a granite base with air cushions for vibration isolation. The optical system includes highly reflective mirrors and acousto-optic modulators for real-time beam correction.

Lens & Resolution

  • 2 mm lens (optical autofocus): 600 nm
  • 10 mm lens (pneumatic autofocus): 2 µm
  • 40 mm lens (pneumatic autofocus): 10 µm


Applications
  • Patterning of photomasks
  • Direct laser writing of patterns

Processes

The following exposure parameters may be used to expose photomasks.

Resist Write Head Filter(s) Laser Power (mW) Intensity Focus # of passes Focus mode
AZ1500 10mm 50% 65 90% 90 1 Pneumatic
IP3500 10mm None 95 90% 90 1 Pneumatic
IP3500 2mm 50% & 12.5% 65 60% -5 1 Pneumatic


The following exposure parameters may be used to direct write into S1800 resist (soft baked at 115C for 1 minute) on silicon. For the optimum focus, please refer to the "AZ1500.txt" or "IP3500.txt" files for the optimum value to use.

Resist Spin Speed (RPM) Write Head Filter(s) Laser Power (mW) Intensity # passes Focus mode
S1805 3000 10mm 50% 95 60% 1 pneumatic
S1805 3000 2mm 1% 95 100% 1 pneumatic
S1813 4000 10mm None 95 60% 1 pneumatic
S1818 3000 10mm None 95 90% 1 pneumatic
S1818 3000 2mm 12.5% 60 40% 1 pneumatic

Resources

SOPs & Troubleshooting