Difference between revisions of "Equipment"
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(Created page with "== Deposition == ===== Evaporation ===== * Lesker Nano-36 Thermal Evaporator * Lesker PVD75 E-Beam/Thermal Evaporator * Lesker PVD75 E-beam Evaporator ===== Sputtering =====...") |
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| Line 16: | Line 16: | ||
* MRL LPCVD Silicon Nitride Furnace | * MRL LPCVD Silicon Nitride Furnace | ||
| − | ===== | + | == Etch == |
| − | * SCS PDS2010 Parylene Coater | + | ===== Plasma Etch ===== |
| + | * Anatech SCE-108 Barrel Asher | ||
| + | * SPTS Si DRIE | ||
| + | * Oxford 80 Plus RIE | ||
| + | * Oxford Cobra ICP Etcher | ||
| + | * Jupiter II RIE Plasma Etcher | ||
| + | |||
| + | ==== Vapor / Wet Etch ==== | ||
| + | * SPTS/Xactix XeF2 Isotropic Etcher | ||
| + | |||
| + | == Lithography == | ||
| + | ==== E-beam Lithography ==== | ||
| + | * Elionix ELS-7500EX E-Beam Lithography System | ||
| + | * Litho Workstation for BEAMER and TRACER | ||
| + | |||
| + | ==== Laser Lithography ==== | ||
| + | * Heidelberg DWL 66+ Laser Writer | ||
| + | * Nanoscribe Photonic Professional GT | ||
| + | |||
| + | ==== Photolithography ==== | ||
| + | * SUSS MicroTec MA6 Gen3 Mask Aligner | ||
| + | |||
| + | ==== Imprint Lithography ==== | ||
| + | * Nanonex NX2600 Nanoimprint | ||
| + | |||
| + | == Soft Lithography == | ||
| + | * Anatech SCE-106 Barrel Asher | ||
| + | * ABM3000HR Mask Aligner | ||
| + | * SCS PDS2010 Parylene Coater | ||
| + | * Silanization Dessicator | ||
| + | * Spinner - SU-8/PDMS | ||
Revision as of 14:05, 14 March 2022
Deposition
Evaporation
- Lesker Nano-36 Thermal Evaporator
- Lesker PVD75 E-Beam/Thermal Evaporator
- Lesker PVD75 E-beam Evaporator
Sputtering
- Lesker PVD75 DC/RF Sputterer
- Denton Explorer14 Magnetron Sputterer
Chemical Vapor Deposition (CVD)
- Cambridge Nanotech S200 ALD
- Veeco Savannah 200
- Oxford PlasmaLab 100 PECVD
- MRL Wet/Dry Thermal Oxide Furnace
- MRL LPCVD Silicon Nitride Furnace
Etch
Plasma Etch
- Anatech SCE-108 Barrel Asher
- SPTS Si DRIE
- Oxford 80 Plus RIE
- Oxford Cobra ICP Etcher
- Jupiter II RIE Plasma Etcher
Vapor / Wet Etch
- SPTS/Xactix XeF2 Isotropic Etcher
Lithography
E-beam Lithography
- Elionix ELS-7500EX E-Beam Lithography System
- Litho Workstation for BEAMER and TRACER
Laser Lithography
- Heidelberg DWL 66+ Laser Writer
- Nanoscribe Photonic Professional GT
Photolithography
- SUSS MicroTec MA6 Gen3 Mask Aligner
Imprint Lithography
- Nanonex NX2600 Nanoimprint
Soft Lithography
- Anatech SCE-106 Barrel Asher
- ABM3000HR Mask Aligner
- SCS PDS2010 Parylene Coater
- Silanization Dessicator
- Spinner - SU-8/PDMS