Cambridge Nanotech S200 ALD

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Description

Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.

The Penn Savannah is capable of holding substrates of different sizes (up to 200mm). It is equipped with six precursor lines for deposition of Al2O3, HfO2, TiO2, and SiO2.

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