What is Chemical Vapor Deposition (CVD)?
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Chemical Vapor Deposition (CVD) is a thin-film deposition technique in which thin films are deposited onto a substrate surface through the chemical reaction of vapor-phase precursor molecules.in which thin films are deposited onto a substrate surface through the chemical reaction of vapor-phase precursor molecules.
The basic process involves the following steps:
- Precursor Delivery: Precursor gases (or vapors) are introduced into a reaction chamber containing the substrate material.
- Chemical Reaction: The precursor molecules react with the substrate surface or with other reactive species present in the chamber, leading to the deposition of a thin film of material on the substrate.
- Film Growth: The deposited material grows on the substrate surface as the chemical reaction continues. The growth rate can be controlled by adjusting parameters such as precursor flow rate, temperature, and pressure.
- Evacuation: Any unreacted precursor gases, reaction byproducts, and excess materials are removed from the chamber through evacuation or purging.