Amorphous silicon deposition

From Quattrone Nanofabrication Facility

Revision as of 14:51, 14 October 2024 by Lucasamb (talk | contribs)

(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

Jump to navigation Jump to search

Goal

Determine the a-Si deposition rate on CVD-01

Materials

SiO₂

Equipment

Units

Protocol

Results

Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=Amorphous_silicon_deposition&oldid=2073"