Raith EBPG5200+ E-Beam Lithography System

Raith EBPG5200+ EBL

Tool Name	Raith EBPG5200+ EBL
Instrument Type	Lithography
Staff Manager	David Barth
Lab Location	Bay 4
Tool Manufacturer	Raith
Tool Model	EBPG5200+
NEMO Designation	EBL-03
Lab Phone	8-9799
SOP Link	SOP

Description

The Raith EBPG5200+ is an electron beam lithography tool capable of high resolution patterning at 100 kV. It has a 125 MHz pattern generator, a maximum current of 350 nA, and a 1 mm mainfield size. It has an automatic aperture changer, automatic and dynamic focus and stigmation, and automatic alignment. The EBPG can achieve linewidths <8nm with stitching and overlay accuracy better than 10nm.

Applications

• Large scale, high speed patterning of positive and negative e-beam resists with features from <10 nm to micron/mm scale

Allowed Materials

• Standard semiconductor materials
• Low vapor pressure metals
• Resists
  • Standard e-beam resists
  • Stockroom e-beam resists
  • PMGI

Resources

Useful Information

• SOP
• Graph of Spotsize vs. Current (Internal Use Only)
• Alignment Mark Guidelines

Resist and Process Data

• PMMA A2 and A4 Spin Curves
• DisCharge Spin-on Anticharging Agent
• Cold Development for PMMA and ZEP
• IPA:H₂O for High Contrast Development of PMMA
• ZEP520A Contrast Curve