View source for What is Chemical Vapor Deposition (CVD)?

Chemical Vapor Deposition (CVD) is a thin-film deposition technique in which thin films are deposited onto a substrate surface through the chemical reaction of vapor-phase precursor molecules.

The basic process involves the following steps:

# '''Precursor Delivery:''' Precursor gases (or vapors) are introduced into a reaction chamber containing the substrate material.
# '''Chemical Reaction:''' The precursor molecules react with the substrate surface or with other reactive species present in the chamber, leading to the deposition of a thin film of material on the substrate.
# '''Film Growth:''' The deposited material grows on the substrate surface as the chemical reaction continues. The growth rate can be controlled by adjusting parameters such as precursor flow rate, temperature, and pressure.
# '''Evacuation:''' Any unreacted precursor gases, reaction byproducts, and excess materials are removed from the chamber through evacuation or purging.