Reactive Ion Etcher
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| Tool Name | QNF RIE |
|---|---|
| Instrument Type | Etch |
| Staff Manager | Lucas Barreto |
| Lab Location | Bay 1 |
| Tool Manufacturer | |
| Tool Model | |
| NEMO Designation | DE-10 |
| Nearest Phone | 215-898-9748 |
| SOP Link | SOP |
Description
The RIE is an anisotropic etch tool. The tool is capable of etching a variety of materials such as oxides, nitrides and some metals. The tool is connected to Ar, O2, CF4, CHF3, SF6.
The following materials are NOT allowed in the chamber
- Pb, In, Se.
- Etching noble metals is not allowed.
- If you have small amounts of noble metals on your sample, you can run your etching process on the tool. In this case, contact the staff.
Standard Process Information
Etch Rate
- PECVD SiO2 CHF3/O2 recipe: 26 nm/min
Resources
SOP